Individual skill

ald-process-controller

Atomic Layer Deposition skill for conformal thin film deposition with atomic-level thickness control

library/specializations/domains/science/nanotechnology/skills/ald-process-controller/SKILL.md

Read pinned source

Source commit feb68abe397acc14f32b34984975c48fedba2b33

What was checked

Matches the observed repository HEAD
Yes
Scanner rules are current
Yes
Repository scan complete
No
Skill scan complete
No
Observed behavior
Network or broad shell
Last checked
Nov 9, 2026

These are observations at the recorded commit, not a guarantee of safety. Review the source before running it.

Install this skill

Choose an agent in your Stack or copy a command below. Commands fetch the pinned commit and copy only this skill directory. Existing destinations are refused. Copying a command does not install anything.

An install command is unavailable: current rules, complete repository and skill scans, an eligible behavior level and a permitted license are required.

Repository context

Repository stars (not skill ratings)
1,901
Repository last updated
Nov 1, 2026
License
MIT

Observed agent integration: No specific integration evidence. Standard SKILL.md installation does not imply verified compatibility.

Files and excerpt

File metadata and permitted, redacted excerpts come from the recorded scan. Source links are pinned to that commit.

Browse files
Read excerpt

# ALD Process Controller

## Purpose

The ALD Process Controller skill provides comprehensive atomic layer deposition process control, enabling conformal thin film growth with atomic-level precision through optimized pulse sequences and in-situ monitoring.

## Capabilities

- Precursor pulse/purge optimization
- Growth per cycle (GPC) characterization
- Film uniformity mapping
- Conformality assessment
- In-situ monitoring integration
- Multi-component film design
Back to top