Individual skill
ebl-process-controller
Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction
library/specializations/domains/science/nanotechnology/skills/ebl-process-controller/SKILL.md
Source commit feb68abe397acc14f32b34984975c48fedba2b33
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- Last checked
- Nov 9, 2026
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- Repository last updated
- Nov 1, 2026
- License
- MIT
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SKILL.mdcore · 2,105 bytes
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# EBL Process Controller
## Purpose
The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.
## Capabilities
- Pattern design and fracturing
- Dose optimization and modulation
- Proximity effect correction (PEC)
- Alignment and overlay control
- Resist processing optimization
- Critical dimension (CD) control